Method and system for reducing layout distortion due to exposure non-uniformity

A non-transitory computer-readable storage medium, comprising instructions which, when executed by a processor, perform the steps of:

• receiving a design layout comprising a feature in a peripheral region of the design layout;
• determining compensation values associated with the peripheral region according to a reflectivity of a pellicle assembly, the pellicle assembly being disposed over a mask;
• adjusting the design layout by modifying a shape of the feature according to the compensation values through the steps of:
• partitioning the peripheral region into compensation zones;
• dissecting an edge of the feature into edge segments, wherein each of the edge segments is arranged within one of the compensation zones;
• assigning the compensation values to the respective compensation zones;
• and
• adjusting locations of the edge segments according to the compensation values associated with the respective compensation zones;
• and
• causing the mask to be manufactured according to the design layout.

A system, comprising a processor and one or more programs including instructions which, when executed by the processor, cause the system to:

• receive a design layout comprising a feature in a peripheral region of the design layout;
• determine compensation values associated with a pellicle assembly and the peripheral region according to an exposure distribution in an exposure field of a workpiece;
• dissecting an edge of the feature into edge segments;
• partitioning the peripheral region into compensation zones;
• assigning the compensation values to the respective compensation zones;
• and
• reducing line widths of the feature on a basis of the edge segments according to the compensation values associated with the respective compensation zones;
• and
• perform a lithography operation that transfers a pattern of the feature to the workpiece.