# US 11,899,359 B2 · Method and apparatus for removing a particle from a photolithographic mask > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,899,359 B2 - Document ID: US11899359B2 - Status: Granted - Kind: B2 - Application number: 17/838,520 - Filed: 2022-06-13 - Published: 2022-11-10 - Granted: 2024-02-13 - Earliest claimed: 2018-04-24 - Assignees: Carl Zeiss SMT GmbH - Applicants: Carl Zeiss SMT GmbH - Inventors: Christof Baur; Hans Hermann Pieper - Web page: https://patentgrep.com/patent/US11899359B2 ## CPC - G03F 1/82: Auxiliary processes, e.g. cleaning or inspecting - G03F 7/70925: {Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract The present application relates to a method for removing a particle from a photolithographic mask, including the following steps: (a) positioning a manipulator, which is movable relative to the mask, in the vicinity of the particle to be removed; (b) connecting the manipulator to the particle by depositing a connecting material on the manipulator and/or the particle from the vapor phase; (c) removing the particle by moving the manipulator relative to the photolithographic mask; and (d) separating the removed particle from the manipulator by carrying out a particle-beam-induced etching process which removes at least a portion of the manipulator. ## Claims ### Claim 1 An apparatus for removing a particle from a photolithographic mask, comprising: a. a manipulator, which is movable relative to the mask and which is movable into the vicinity of the particle to be removed; and b. a deposition apparatus, which is embodied to deposit a connecting material on the manipulator and/or on the particle from a vapor phase in order to connect the manipulator to the particle, wherein the deposition apparatus is further embodied to provide through the manipulator a particle beam that induces the deposition, wherein the deposition apparatus comprises a gas supply system configured to supply at least one precursor gas, wherein the at least one precursor gas when induced by the particle beam is configured to facilitate deposition of the connecting material. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the apparatus comprises a separating apparatus, which is embodied to separate the removed particle from the manipulator. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the manipulator defines an opening. ### Claim 4 (depends on 3) The apparatus of claim 3, wherein a diameter of the opening of the manipulator is smaller than a diameter of a particle to be removed. ### Claim 5 (depends on 3) The apparatus of claim 3, wherein the diameter of the opening is within a range of 30 nm to 70 nm. ### Claim 6 (depends on 3) The apparatus of claim 3, wherein the opening has a form of a circle, a triangle, a rectangle or a square. ### Claim 7 (depends on 1) The apparatus of claim 1, further comprising a detector for detecting x-ray radiation. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein the gas supply system is configured to provide at least one precursor gas for depositing the connecting material at a position of the manipulator, in which the at least one precursor gas comprises at least one of ethene, styrene, pyrene, hexadecane, liquid paraffins, formic acid, acrylic acid, propionic acid, or methyl methacrylate. ### Claim 9 An apparatus for removing a particle from a photolithographic mask, comprising: a. a manipulator, which is movable relative to the mask and which is movable into the vicinity of the particle to be removed; and b. a deposition apparatus, which is embodied to deposit a connecting material on the manipulator and/or on the particle from a vapor phase in order to connect the manipulator to the particle, wherein the deposition apparatus is further embodied to provide through the manipulator a particle beam that induces the deposition. ### Claim 10 (depends on 9) The apparatus of claim 9, wherein the apparatus comprises a separating apparatus, which is embodied to separate the removed particle from the manipulator. ### Claim 11 (depends on 9) The apparatus of claim 9, wherein the manipulator defines an opening. ### Claim 12 (depends on 11) The apparatus of claim 11, wherein a diameter of the opening of the manipulator is smaller than a diameter of a particle to be removed. ### Claim 13 (depends on 11) The apparatus of claim 11, wherein the diameter of the opening is within a range of 30 nm to 70 nm. ### Claim 14 (depends on 11) The apparatus of claim 11, wherein the opening has a form of a circle, a triangle, a rectangle or a square. ### Claim 15 (depends on 9) The apparatus of claim 9, further comprising a detector for detecting x-ray radiation. ### Claim 16 (depends on 9) The apparatus of claim 9, wherein the apparatus is embodied to provide at least one precursor gas for depositing connecting material at a position of the manipulator, in which the at least one precursor gas comprises at least one of ethene, styrene, pyrene, hexadecane, liquid paraffins, formic acid, acrylic acid, propionic acid, or methyl methacrylate.