Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method
AssigneeHoya Corporation
InventorsKazuhiro Hamamoto, Takashi Uchida
Life of this patent
Estimating the term…
Loading patent…
AssigneeHoya Corporation
InventorsKazuhiro Hamamoto, Takashi Uchida
Estimating the term…
A reflective film coated substrate includes a substrate having two main surfaces opposite to each other and end faces connected to outer edges of the two main surfaces; and a reflective film formed on one of the main surfaces and extending onto at least part of the end faces. The reflective film on the main surface has a multilayer structure including low refractive index layers and high refractive index layers alternately formed. The reflective film which extends onto the end faces has a single-layer structure containing a first element higher in content than any other element in the low refractive index layers and a second element higher in content than any other element in the high refractive index layers.
A reflective film coated substrate comprising:
A mask blank comprising:
A reflective mask comprising:
Dependencies are inferred from the claim text.