Coating apparatus and coating method
AssigneeJiangsu Favored Nanotechnology Co., Ltd.
InventorJian Zong
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Abstract
A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source and a plasma generation source. The supporting rack has a supporting area for supporting the substrate. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber. The plasma generation source is arranged for exciting the coating forming material, wherein the supporting area of the supporting rack is located at a position between the monomer discharge source and the plasma generation source, so that the coating is evenly formed on the surface of the substrate, and the deposition velocity is increased.
Claims27
A coating apparatus for coating a substrate, comprising:
- a chamber body having a reaction chamber, wherein said chamber body has a substrate positioning area for positioning the substrate;
- the substrate being supported on a movable substrate rack;
- a monomer discharge source having a discharge inlet for introducing a coating forming material into said reaction chamber of said chamber body;
- and
- a plasma generation source disposed at a distance in said reaction chamber of said chamber body for exciting the coating forming material, wherein said substrate positioning area is located at a position between said monomer discharge source and said plasma generation source in such manner that the substrate is adapted for being arranged between said monomer discharge source and said plasma generation source,
- wherein the substrate rack is adapted to be repeatedly moved back and forth linearly between said monomer discharge source and said plasma generation source.
A coating apparatus for coating a substrate, comprising:
- a chamber body having a reaction chamber;
- a supporting rack having a supporting area for supporting the substrate within said reaction chamber of said chamber body;
- a monomer discharge source having a discharge inlet for introducing a coating forming material into said reaction chamber of said chamber body;
- and
- a plasma generation source disposed at a distance in said reaction chamber of said chamber body for exciting the coating forming material, wherein said supporting area of said supporting rack is located at a position between said monomer discharge source and said plasma generation source in such manner that the substrate is adapted for being arranged between said monomer discharge source and said plasma generation source,
- wherein the supporting rack is adapted to be repeatedly moved back and forth linearly between said monomer discharge source and said plasma generation source.
Dependencies are inferred from the claim text.