# US 11,898,244 B2 · Plasma-enhanced chemical vapor deposition method of forming lithium-based film by using the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,898,244 B2 - Document ID: US11898244B2 - Status: Granted - Kind: B2 - Application number: 17/497,523 - Filed: 2021-10-08 - Published: 2022-01-27 - Granted: 2024-02-13 - Earliest claimed: 2016-07-11 - Assignees: Samsung Electronics Co., Ltd. - Applicants: Samsung Electronics Co., Ltd. - Inventors: Jooho Lee; Yongsung Kim; Sanghoon Song; Wooyoung Yang; Changseung Lee; Sungjin Lim; Junsik Hwang - Web page: https://patentgrep.com/patent/US11898244B2 ## CPC - C23C 16/045: {Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates} - C23C 16/34: Nitrides {(C23C16/303 takes precedence)} - C23C 16/00: Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) - C23C 16/06: characterised by the deposition of metallic material - C23C 16/308: {Oxynitrides} - C23C 16/4408: {by purging residual gases from the reaction chamber or gas lines} - C23C 16/45523: {Pulsed gas flow or change of composition over time} - C23C 16/50: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} - C23C 16/515: using pulsed discharges - H01J 37/32: Gas-filled discharge tubes (heating by discharge H05B) - H01J 37/3244: {Gas supply means} - H01M 4/0428: {Chemical vapour deposition} - H01M 4/13: Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof - H01M 10/052: Li-accumulators - H01M 16/00: Structural combinations of different types of electrochemical generators - H01J 2237/3321: CVD [Chemical Vapor Deposition] - H01M 10/0562: Solid materials - H01M 2220/30: Batteries in portable systems, e.g. mobile phone, laptop - H01M 2300/0068: inorganic - Y02E 60/10: Energy storage using batteries - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H01M: PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY - Y02E: REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION ## Abstract A method of forming a lithium (Li)-based film, may include: supplying a Li source material into a reaction chamber in which a substrate is disposed; supplying phosphor (P) and oxygen (O) source materials and a nitrogen (N) source material into the reaction chamber; and generating plasma in the reaction chamber to form a Li-based film on the substrate from the Li, P, O, and N source materials, wherein the supplying of the Li source material into the reaction chamber and the supplying of the P and O source materials and the N source material into the reaction chamber are performed with a time interval, and wherein the Li source material supplied into the reaction chamber is deposited on the substrate, and the P and O source materials supplied into the reaction chamber are adsorbed on the Li source material. ## Claims ### Claim 1 A method of forming a lithium (Li)-based film, the method comprising: supplying a Li source material into a reaction chamber in which a substrate is disposed, in a first time duration; supplying phosphor (P) and oxygen (O) source materials and a nitrogen (N) source material into the reaction chamber, in a second time duration and a third time duration; and generating plasma in the reaction chamber to form a Li-based film on the substrate from the Li, P, O, and N source materials in the third time duration by supplying power into the reaction chamber in the third time duration and not in the first time duration and the second time duration, wherein the supplying of the Li source material into the reaction chamber and the supplying of the P and O source materials and the N source material into the reaction chamber are performed with a time interval, wherein the Li source material supplied into the reaction chamber is deposited on the substrate, and the P and O source materials supplied into the reaction chamber are adsorbed on the Li source material, and wherein the second time duration follows the first time duration, and the third time duration follows the second time duration. ### Claim 2 (depends on 1) The method of claim 1, further comprising purging an interior of the reaction chamber between the supplying of the Li source material into the reaction chamber and the supplying of the P and O source materials and the N source material into the reaction chamber. ### Claim 3 (depends on 1) The method of claim 1, wherein a bonding between the P source material and the N source material (P—N bonding) is formed by generating the plasma in the reaction chamber when the P and O source materials and the N source material are supplied into the reaction chamber. ### Claim 4 (depends on 3) The method of claim 3, wherein an amount of the N source material supplied into the reaction chamber is adjusted by controlling an on-off time of generation of the plasma. ### Claim 5 (depends on 1) The method of claim 1, further comprising purging an interior of the reaction chamber after the Li-based film is formed on the substrate. ### Claim 6 (depends on 1) The method of claim 1, wherein a reaction temperature of the substrate in a process of forming the Li-based film is about 100° C. to about 450° C. ### Claim 7 (depends on 1) The method of claim 1, wherein the substrate comprises at least one three-dimensional (3D) structure having an aspect ratio of at least 1:1. ### Claim 8 (depends on 7) The method of claim 7, wherein the 3D structure comprises a cathode having a 3D structure, and the Li-based film comprises a solid electrolyte film deposited on a surface of the cathode. ### Claim 9 (depends on 7) The method of claim 7, wherein the 3D structure comprises an anode having a 3D structure, and the Li-based film comprises a solid electrolyte film or a protective film deposited on a surface of the anode. ### Claim 10 (depends on 7) The method of claim 7, wherein the 3D structure comprises a conductive carbon electrode having a 3D structure, and the Li-based film comprises a solid electrolyte film or a protective film deposited on a surface of the conductive carbon electrode.