# US 11,897,265 B2 · Cleaning liquid, set, ink-jet recording apparatus and cleaning method

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- Number: US 11,897,265 B2
- Document ID: US11897265B2
- Status: Granted
- Kind: B2
- Application number: 17/538,243
- Filed: 2021-11-30
- Published: 2022-04-14
- Granted: 2024-02-13
- Earliest claimed: 2019-05-31
- Assignees: Brother Kogyo Kabushiki Kaisha
- Applicants: Brother Kogyo Kabushiki Kaisha
- Inventors: Taro Nagano; Hirofumi Kuriki; Shunichi Higashiyama
- Web page: https://patentgrep.com/patent/US11897265B2

## CPC

- B41J 2/16552: {using cleaning fluids}
- C11D 1/721: {End blocked ethers}
- C11D 3/2044: {linear}
- C11D 3/2068: {Ethers}
- C11D 3/43: Solvents
- B41J 2002/16558: {Using cleaning liquid for wet wiping}
- C11D 2111/20: Industrial or commercial equipment, e.g. reactors, tubes or engines
- B41J: TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- C11D: DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL

## Abstract

There is provided a cleaning liquid usable for cleaning of an ink-jet recording apparatus, the cleaning liquid including: a first water-soluble organic solvent, a vapor pressure at 20° C. of the first water-soluble organic solvent being not less than 7 Pa; a second water-soluble organic solvent, a vapor pressure at 20° C. of the second water-soluble organic solvent being not more than 1 Pa; a nonionic surfactant; and water. The cleaning liquid satisfies the following conditions (1) to (3): Condition (1): 10≤A+B≤60; Condition (2): A/B≥1; Condition (3): (A+B)/C≥10. In the conditions (1) to (3), A: a content amount (% by mass) of the first water-soluble organic solvent, B: a content amount (% by mass) of the second water-soluble organic solvent, and C: a content amount (% by mass) of the nonionic surfactant.

## Claims

### Claim 1

A cleaning liquid usable for cleaning of an ink-jet recording apparatus, the cleaning liquid comprising:
a first water-soluble organic solvent, a vapor pressure at 20° C. of the first water-soluble organic solvent being not less than 7 Pa;
a second water-soluble organic solvent, a vapor pressure at 20° C. of the second water-soluble organic solvent being not more than 1 Pa;
a nonionic surfactant; and
water,
wherein the cleaning liquid satisfies the following conditions (1) to (3):
10≤A+B≤60 Condition (1):
A/B≥1 Condition (2):
(A+B)/C≥10, Condition (3):
in the conditions (1) to (3),
A: a content amount (% by mass) of the first water-soluble organic solvent in an entire amount of the cleaning liquid,
B: a content amount (% by mass) of the second water-soluble organic solvent in the entire amount of the cleaning liquid, and
C: a content amount (% by mass) of the nonionic surfactant in the entire amount of the cleaning liquid.

### Claim 2 (depends on 1)

The cleaning liquid according to claim 1, wherein the first water-soluble organic solvent includes at least one selected from the group consisting of: propylene glycol, ethylene glycol and 1,3-butanediol.

### Claim 3 (depends on 1)

The cleaning liquid according to claim 1, wherein the second water-soluble organic solvent includes at least one selected from the group consisting of: glycerol, diethylene glycol, tripropylene glycol, 1,5-pentanediol, triethylene glycol-n-butyl ether and tripropylene glycol-n-butyl ether.

### Claim 4 (depends on 1)

The cleaning liquid according to claim 1, wherein the nonionic surfactant includes an acetylene glycol-based surfactant having an ethylene oxide skeleton.

### Claim 5 (depends on 1)

The cleaning liquid according to claim 1, the cleaning liquid being usable together with a water-based ink for ink-jet recording including water-insoluble particles and water.

### Claim 6 (depends on 1)

The cleaning liquid according to claim 1, the cleaning liquid being usable for cleaning of at least one selected from the group consisting of: an ink-jet head, an ink channel and a wiper configured to make contact with a nozzle-formation surface of the ink-jet head and to wipe off an ink from the nozzle-formation surface, in the ink-jet recording apparatus.

### Claim 7 (depends on 1)

A set comprising:
the cleaning liquid as defined in claim 1; and
a water-based ink for ink-jet recording including water-insoluble particles and water.

### Claim 8 (depends on 1)

An ink-jet recording apparatus comprising:
an ink storage configured to store an ink therein;
an ink-jet head configured to discharge the ink stored in the ink storage;
an ink channel provided between the ink storage and the ink-jet head; and
a cleaning liquid-supplying mechanism configured to supply, to the ink-jet head and the ink channel, the cleaning liquid as defined in claim 1.

### Claim 9 (depends on 8)

The ink-jet recording apparatus according to claim 8, further comprising a wiper configured to make contact with a nozzle-formation surface of the ink-jet head and to wipe off the ink from the nozzle-formation surface,
wherein the cleaning liquid-supplying mechanism is configured to supply the cleaning liquid to the wiper.

### Claim 10 (depends on 8)

The ink-jet recording apparatus according to claim 8, further comprising a drying mechanism configured to dry a recording part recorded with the ink.

### Claim 11 (depends on 1)

A cleaning method of cleaning an ink-jet recording apparatus including: an ink storage, an ink-jet head, an ink channel provided between the ink storage and the ink-jet head, and a cleaning liquid-supplying mechanism,
the cleaning method comprising supplying the cleaning liquid as defined in claim 1 to the ink-jet head and the ink channel, by using the cleaning liquid-supplying mechanism.

### Claim 12 (depends on 11)

The cleaning method according to claim 11, wherein the ink-jet recording apparatus further includes a wiper configured to make contact with a nozzle-formation surface of the ink-jet head and to wipe off an ink from the nozzle-formation surface; and
the cleaning method further comprises supplying the cleaning liquid to the wiper by the cleaning liquid-supplying mechanism.
