# US 11,897,006 B2 · Apparatus and method for processing substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,897,006 B2 - Document ID: US11897006B2 - Status: Granted - Kind: B2 - Application number: 17/740,358 - Filed: 2022-05-10 - Published: 2022-12-01 - Granted: 2024-02-13 - Earliest claimed: 2021-05-26 - Assignees: Semes Co., Ltd. - Applicants: Semes Co., Ltd. - Inventors: Ki Young Kwak; Sang Young Kwon; Cha Sub Shim - Web page: https://patentgrep.com/patent/US11897006B2 ## CPC - B08B 3/022: {Cleaning travelling work (B08B3/042 takes precedence)} - H10P 72/0414: {using mainly spraying means, e.g. nozzles} - B08B 3/08: the liquid having chemical or dissolving effect - B08B 3/14: Removing waste, e.g. labels, from cleaning liquid - B08B 2203/0264: Splash guards - B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract The present disclosure provides a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a substrate support unit configured to support a substrate, a liquid supply unit configured to supply a liquid containing any one of a chemical liquid and a cleaning liquid to the substrate supported by the substrate support unit, a processing container configured to accommodate the substrate support unit and recover the liquid supplied to the substrate from the liquid supply unit, and a capture module provided in the processing container to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering. ## Claims ### Claim 1 A substrate processing apparatus comprising: a substrate support unit configured to support a substrate; a liquid supply unit configured to supply a liquid containing either a chemical liquid or a cleaning liquid to the substrate supported by the substrate support unit; a processing container configured to accommodate the substrate support unit and recover the liquid supplied to the substrate from the liquid supply unit; and a capture module provided in the processing container and configured to capture the liquid scattered from the substrate, the capture module configured to be movable forward and backward in a sliding manner from an inner wall of the processing container and be operated in a position adjustment mode for capturing the liquid. ### Claim 2 (depends on 1) The substrate processing apparatus of claim 1, wherein the capture module is configured to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering. ### Claim 3 (depends on 1) The substrate processing apparatus of claim 1, wherein the capture module includes a mesh net structure configured to capture the re-scattered liquid. ### Claim 4 (depends on 1) The substrate processing apparatus of claim 1, wherein the capture module is located inside the processing container in a multi-layered form to capture the liquid. ### Claim 5 (depends on 2) The substrate processing apparatus of claim 2, wherein the capture module includes a polypropylene (PP) material. ### Claim 6 (depends on 2) The substrate processing apparatus of claim 2, wherein the specifications of the capture module include a thickness in a range of 0.5 T to 1 T, and a width of at least 10 mm. ### Claim 7 (depends on 1) The substrate processing apparatus of claim 1, wherein the capture module, primarily captures the chemical liquid scattered to the processing container based on the supply of the chemical liquid to the substrate by the liquid supply unit, and secondarily captures the cleaning liquid scattered to the processing container based on the supply of the cleaning liquid to the substrate by the liquid supply unit, wherein the chemical liquid primarily captured in advance is cleaned through the secondary capture. ### Claim 8 (depends on 1) The substrate processing apparatus of claim 1, wherein the processing container comprises: a first processing container; a second processing container configured to form a first inflow space with the first processing container; and a third processing container configured to form a second inflow space with the second processing container, wherein the capture module is provided in at least any one of the first inflow space and the second inflow space to capture the inflowing liquid. ### Claim 9 (depends on 1) The substrate processing apparatus of claim 1, wherein the capture module is installed to be spaced apart from an inner wall of the processing container through a connector installed on the inner wall of the processing container. ### Claim 10 (depends on 9) The substrate processing apparatus of claim 9, wherein the capture module is tilted in a predetermined range on the connector and operated in another position adjustment mode for capturing the liquid. ### Claim 11 (depends on 1) The substrate processing apparatus of claim 1, wherein the capture module is installed singly or in a plurality on the processing container. ### Claim 12 A substrate processing apparatus comprising: a substrate support unit configured to support a substrate; a liquid supply unit configured to supply a liquid containing either a chemical liquid or a cleaning liquid to the substrate supported by the substrate support unit; a processing container configured to accommodate the substrate support unit and recover the liquid supplied to the substrate from the liquid supply unit; and a capture module provided in the processing container and configured to capture the liquid scattered from the substrate, wherein the capture module is configured to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering, and includes a mesh net structure for capturing the re-scattered liquid, is located inside the processing container in a multi-layered form to capture the liquid, and is configured to primarily capture the chemical liquid scattered to the processing container based on the supply of the chemical liquid to the substrate by the liquid supply unit, and is configured to secondarily capture the cleaning liquid scattered to the processing container based on the supply of the cleaning liquid to the substrate by the liquid supply unit such that the chemical liquid primarily captured in advance is cleaned through the secondary capture, and wherein the capture module is configured to be movable forward and backward in a sliding manner from an inner wall of the processing container and be operated in a position adjustment mode for capturing the liquid.