Etching method for forming vertical structure, electronic device including vertical structure formed by the etching method, and method of manufacturing the electronic device
AssigneeSamsung Electronics Co., Ltd.
InventorsChoongho Rhee, Sungchan Kang, Yongseop Yoon
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Abstract
An etching method for forming a vertical structure is provided. The etching method may include: positioning a mask on a substrate, wherein the mask includes an opening pattern and a compensation pattern, and the compensation pattern is disposed at a corner of two adjacent sides of the opening pattern and includes a concave compensation pattern that is indented from one of the two adjacent sides; and forming the vertical structure on the substrate through the opening pattern of the mask by a dry etching process.
Claims21
An etching method for forming a vertical structure, the etching method comprising:
- positioning a mask on a substrate, an opening pattern of the mask comprising a compensation pattern that is disposed at a corner of the opening pattern and is indented from the corner of the opening pattern towards an outer boundary of the mask;
- and
- forming the vertical structure on the substrate through the opening pattern of the mask by a dry etching process.
An etching method for forming a vertical structure, the etching method comprising:
- positioning a mask on a substrate, the mask comprising an opening pattern and a compensation pattern, the compensation pattern being disposed at a corner of two adjacent sides of the opening pattern, and comprising a concave compensation pattern that is indented from one of the two adjacent sides;
- and
- forming the vertical structure on the substrate through the opening pattern of the mask by a dry etching process,
- wherein the opening pattern of the mask comprises a plurality of steps, and
- the concave compensation pattern is formed in at least one step of the plurality of steps to extend from the at least one step or to be indented from the at least one step.
An electronic device comprising:
- an electronic sensor comprising a vertical structure and a floating structure that are disposed on a substrate,
- wherein the vertical structure comprises an indented structure disposed at a corner of two adjacent side walls,
- wherein the floating structure protrudes from one of the two adjacent side walls of the vertical structure, and
- wherein the vertical structure is formed in the substrate by positioning a mask on the substrate, and wherein an opening pattern of the mask comprises a compensation pattern that is disposed at a corner of the opening pattern and is indented from the corner of the opening pattern towards an outer boundary of the mask.
Dependencies are inferred from the claim text.