Display device with device board and manufacturing method thereof
AssigneeWuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
InventorLei Wang
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Abstract
The present invention provides a display device and a manufacturing method thereof, including: forming a device board; forming a color resist layer on the device board; forming a black matrix layer on the device board, wherein at least a portion of the color resist blocks is defined in a grid region in the black matrix layer, and at least a portion of an orthographic projection of the color resist blocks on the device board covers at least a portion of an orthographic projection of an adjacent part of the black matrix layer on the device board; and forming a planarization layer covering the color resist blocks and the black matrix layer.
Claims16
A manufacturing method of a display device, comprising:
- step A:
- forming a device board;
- step B:
- forming a color resist layer on the device board, wherein color resist blocks in the color resist layer are arranged in an array;
- wherein a thickness of the color resist layer ranges from 1 to 4 microns;
- step B.1:
- modifying a surface of the device board with a laser to form a hydrophilic device board:
- step C:
- forming a black matrix layer on the hydrophilic device board;
- and
- step D:
- forming a planarization layer covering the color resist blocks and the black matrix layer.
A display device, comprising:
- a device board;
- wherein the device board is hydrophilic;
- a color resist layer, wherein color resist blocks in the color resist layer are arranged in an array on the device board;
- a black matrix layer disposed on the device board, and the color resist layer is formed before the black matrix layer is formed;
- and
- a planarization layer covering the color resist blocks and the black matrix layer;
- wherein a thickness of the color resist layer ranges from 1 to 4 microns.
Dependencies are inferred from the claim text.