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US 11,894,546 B2Granted
Atomic layer deposition of stable lithium ion conductive interfacial layer for stable cathode cycling
AssigneeThe Board of Trustees of the Leland Stanford Junior University
InventorsYi Cui, Jin Xie
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Abstract
A coated cathode material includes a cathode active material and an interfacial layer coating the cathode active material. The interfacial layer includes a lithium-containing fluoride which includes at least one additional metal different from lithium.
Claims19
A coated cathode material comprising:
- a cathode active material having a high nickel content of at least about 75% by atomic ratio, wherein the cathode active material is comprised of nickel-containing particles each having a size of about ten microns or less;
- and
- an interfacial layer coating the nickel-containing particles of the cathode active material,
- wherein the interfacial layer includes a lithium-containing fluoride, wherein the lithium-containing fluoride contains lithium and at least one additional metal different from lithium, and wherein the interfacial layer is configured to provide an interface between the cathode active material having high nickel content and an electrolyte.
1 more element
A method of forming a coated cathode material, comprising:
- providing a cathode active material having a high nickel content of at least about 75% by atomic ratio, wherein the cathode active material is comprised of nickel-containing particles each having a size of about ten microns or less;
- and
- forming, via atomic layer deposition, an interfacial layer coating the nickel-containing particles of the cathode active material,
- wherein the interfacial layer includes a lithium-containing fluoride, wherein the lithium-containing fluoride contains lithium and at least one additional metal different from lithium, and wherein the interfacial layer is configured to provide an interface between the cathode active material having high nickel content and an electrolyte.
1 more element
Dependencies are inferred from the claim text.