Colorless transparent semiconductor substrate and method for manufacturing same

A transparent semiconductor substrate comprising:

• a semiconductor substrate including a first surface and a second surface opposite to the first surface, wherein the first surface is parallel to the second surface, wherein the semiconductor substrate includes crystalline silicon (c-Si), germanium (Ge), gallium arsenide (GaAs), gallium arsenide Phosphide (GaAsP), amorphous silicon (a-Si), or a combination thereof;
• and
• a plurality of through-holes, each through-hole penetrating the semiconductor substrate,
• wherein each through-hole includes an inclined portion having a first and a second inclined portions with respect to the first surface and second surface, the first inclined portion forming a first acute angle θ1 with respect to the first surface and the second inclined portion forming a second acute angle θ2 with respect to the first surface, wherein the first acute angle θ1 is same as the second acute angle θ2, wherein a diameter of each through-hole increases from the first surface to the second surface, wherein the diameter of each through-hole at the first surface is smaller than the diameter of each through-hole at the second surface, wherein the first surface is positioned to receive incident light,
• wherein the inclined portion is formed with a coating layer which is a light-reflecting layer or an anti-reflection layer,
• wherein a total area of the plurality of through-holes on the first surface is smaller than a total area of the plurality of through-holes on the second surface, the total area of the plurality of through-holes on the first surface is formed 5% to 95% of a total area of the semiconductor substrate, and the total area of the plurality of through-holes on the second surface is formed 6% to 96% of the total area of the semiconductor substrate,
• wherein a distance between adjacent through holes on the first surface is equal to or less than 200 μm,
• wherein the diameter of each through-hole on the first surface is defined so that a haze value calculated by Equation 1 below is less than 1%,
• H(%)=Td/Tt×100 <Equation 1>
• where Td is diffuse transmittance and Tt is total transmittance.