Silicon carbide MOSFET device and manufacturing method thereof

A manufacturing method of a silicon carbide MOSFET device, comprising:

• providing a substrate of a first doping type;
• forming a patterned first barrier layer on an upper surface of the substrate;
• forming a base region extending from the upper surface to an inside of the substrate through oblique implantation in a first ion implantation process by using a first barrier layer as a mask the base region is of a second doping type;
• forming a source region of the first doping type in the substrate
• forming a contact region of the second doping type in the substrate;
• and
• forming a gate structure,
• wherein, an implantation angle of the first ion implantation process is adjusted so that the base region extends below a part of the first barrier layer, and the implantation angle of the first ion implantation process is an angle between an implanting direction of the first ion implantation process and the upper surface of the substrate;
• wherein forming the contact region comprises:
• forming a shielding layer on an upper surface and sidewalls of the first barrier layer and the upper surface of the substrate;
• and
• forming the contact region extending from the upper surface to the inside of the substrate through self-aligned implantation in a third ion implantation process by using the first barrier layer and the shielding layer as a mask,
• wherein, the third ion implantation process implants dopants into the substrate through the shielding layer located on the upper surface of the substrate to form the contact region, a stacking part of the first barrier layer and the shielding layer and the shielding layer on a sidewall of the first barrier layer resists the implantation of the third ion implantation process.