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US 11,894,439 B2Granted
Semiconductor device
AssigneeUnited Microelectronics Corp.
InventorsHeng-Ching Lin, Yu-Teng Tseng, Chu-Chun Chang, Kuo-Yuh Yang, Chia-Huei Lin
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Abstract
A semiconductor device includes a gate structure on a substrate, in which the gate structure includes a main branch extending along a first direction on the substrate and a sub-branch extending along a second direction adjacent to the main branch. The semiconductor device also includes a first doped region overlapping the main branch and the sub-branch according to a top view and a second doped region overlapping the first doped region.
Claims6
A semiconductor device, comprising:
- a gate structure on a substrate, wherein the gate structure comprises:
- a main branch extending along a first direction on the substrate;
- and
- a sub-branch extending along a second direction adjacent to the main branch;
- a first doped region having dopants of a first conductive type disposed in an entire electrode of the sub-branch and in an adjacent part of an electrode of the main branch, comprises a higher concentration of the first conductive type dopants than a remaining part of the first conductive doped main branch electrode;
- a second doped region having dopants of the first conductive type disposed in the substrate and disposed adjacent to the sub-branch of the gate structure;
- a source/drain region adjacent to two sides of the gate structure;
- a plurality of contact plugs disposed on the source/drain region, wherein the first doped region and the second doped region do not overlap with the contact plugs;
- a spacer disposed on the substrate and surrounding the gate structure;
- and
- a lightly doped drain region disposed in the substrate and disposed under the spacer.
8 more elements
Dependencies are inferred from the claim text.