Method for fabricating an image sensing device having a primary grid and a second grid surrounding the primary grid
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYun-Hao Chen, Kuo-Yu Wu, Tse-Hua Lu
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Abstract
The present disclosure provides an optical structure and a method for fabricating an optical structure, the method includes forming a light detection region in a substrate, forming an isolation structure at surrounding the light detection region, and forming a primary grid over the isolation structure, including forming a metal layer over the isolation structure, forming a first dielectric layer over the metal layer, and partially removing the metal layer and the first dielectric layer with a first mask by patterning, and forming a secondary grid at least partially surrounded by the primary grid laterally.
Claims20
A method for fabricating an optical structure, comprising:
- forming a light detection region in a substrate;
- forming an isolation structure at least surrounding the light detection region;
- and
- forming a primary grid over the isolation structure, comprising:
- forming a metal layer over the isolation structure;
- forming a first dielectric layer over the metal layer;
- and
- partially removing the metal layer and the first dielectric layer with a first mask by patterning;
- forming a secondary grid at least partially surrounded by the primary grid laterally;
- and
- forming a liner lining at a sidewall of the primary grid, wherein the liner is free from being in direct contact with the secondary grid.
A method for fabricating an optical structure, comprising:
- forming a light detection region in a substrate;
- forming an isolation structure surrounding the light detection region;
- and
- forming a primary grid over the isolation structure, comprising:
- forming a metal layer over the isolation structure;
- forming a first dielectric layer over the metal layer;
- and
- patterning the metal layer and the first dielectric layer;
- forming a second dielectric layer over the primary grid;
- forming a trench in the second dielectric layer;
- forming a filling material in the trench;
- and
- forming a secondary grid at least partially surrounded by the primary grid laterally, comprising:
- partially removing the second dielectric layer by patterning, thereby at least a portion of the filling material and a portion of the second dielectric layer below the filling material is remained.
A method for fabricating an optical structure, comprising:
- forming a light detection region in a substrate;
- forming an isolation structure surrounding the light detection region;
- and
- forming a primary grid over the isolation structure, comprising:
- forming a metal layer over the isolation structure;
- forming a first dielectric layer over the metal layer;
- forming an antireflective coating (ARC) layer over the first dielectric layer;
- and
- patterning the metal layer, the first dielectric layer, and the ARC layer;
- forming a second dielectric layer over the substrate, wherein a top surface of the ARC layer is below a top surface of the second dielectric layer;
- and
- forming a secondary grid at least partially surrounded by the primary grid laterally, comprising:
- forming a trench in the second dielectric layer;
- forming a filling material in the trench;
- and
- partially removing the second dielectric layer by patterning, thereby at least a portion of the filling material and a portion of the second dielectric layer below the filling material is remained.
Dependencies are inferred from the claim text.