Array substrate, manufacturing method thereof, and display panel

A method of manufacturing an array substrate, comprising following steps:

• S10:
• providing a substrate, sequentially manufacturing an active layer and a metal contact layer on the substrate, performing a lithography process on the active layer and the metal contact layer with a photomask, and oxidizing a portion of the metal contact layer to form a conductive area and an insulating area, thereby defining a channel area of the active layer;
• S20:
• manufacturing a gate insulating layer on the metal contact layer, manufacturing a gate layer on the gate insulating layer, and performing a lithography process on the gate layer and the gate insulating layer to form a gate;
• and
• S30:
• manufacturing an interlayer insulating layer on the gate layer, manufacturing a source/drain layer on the interlayer insulating layer, and performing a lithography process on the source/drain layer to form a source and a drain which are individually connected to the conductive area.

A display panel, comprising an array substrate;

• wherein the array substrate comprises:
• a substrate;
• an active layer disposed on the substrate and comprising a channel area;
• a metal contact layer disposed on the active layer and comprising a conductive area and an insulating area, wherein the insulating area corresponds to the channel area, and the conductive area is disposed at two sides of the insulating area;
• a gate insulating layer disposed on the metal contact layer;
• a gate layer disposed on the gate insulating layer and comprising a gate, wherein the gate is disposed above the channel area;
• a source/drain layer disposed on the conductive area and comprising a source and a drain;
• and
• a pixel electrode disposed on the source/drain layer and connected to the source or the drain;
• and
• wherein the source and the drain are individually connected to the conductive area.