Method for manufacturing the same having a profile modifier
AssigneeNanya Technology Corporation
InventorsShih-En Lin, Jui-Lin Chin
Life of this patent
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Abstract
A method for manufacturing a semiconductor device structure includes forming a first metallization line and a second metallization line extending along a first direction; forming a first isolation feature and a second isolation feature between the first metallization line and the second metallization line, wherein the first metallization line, the second metallization line, the first isolation feature and the second isolation feature define an aperture; forming a profile modifier within the aperture, wherein the profile modifier comprises a plurality of segments spaced apart from each other, wherein each of the segments are located at corners of the aperture; and forming a contact feature surrounded by the plurality of segments.
Claims20
A method of manufacturing a semiconductor device structure, comprising:
- forming a first metallization line and a second metallization line extending in a parallel;
- forming a first isolation feature and a second isolation feature between the first metallization line and the second metallization line and perpendicularly extended between the first metallization line and the second metallization line, wherein the first metallization line, the second metallization line, the first isolation feature and the second isolation feature define an aperture and form a boundary of the aperture;
- forming a profile modifier within the aperture, wherein the profile modifier comprises a plurality of segments spaced apart from each other, wherein each of the segments are located at corners of the aperture;
- and
- forming a contact feature surrounded by the plurality of segments.
A method of manufacturing a semiconductor device structure, comprising:
- providing a substrate;
- forming a first metallization line and a second metallization line over the substrate, wherein the first metallization line and the second metallization line extending along a first direction;
- forming a third metallization line and a fourth metallization line extending along a second direction different from the first direction;
- forming a first isolation feature and a second isolation feature between the first metallization line and the second metallization line, wherein the first isolation feature and the second isolation feature extend along a third direction, wherein the first metallization line, the second metallization line, the first isolation feature and the second isolation feature define an aperture, wherein the aperture has a profile defining two opposed first sidewalls formed between sidewalls of the first and second metallization lines respectively and two opposed second sidewalls formed between sidewalls of the first and second isolation features respectively, wherein the first sidewalls and the second sidewalls of the aperture form a boundary thereof;
- forming a profile modifier within the aperture to modify the profile of the aperture in a plan view;
- and
- forming a contact feature within the aperture and surrounded by the profile modifier.
Dependencies are inferred from the claim text.