Back to results
US 11,894,257 B2Granted
Single wafer processing environments with spatial separation
AssigneeApplied Materials, Inc.
InventorsMichael Rice, Joseph AuBuchon, Sanjeev Baluja, Mandyam Sriram
Life of this patent
Estimating the term…
Abstract
Apparatus and methods to process one or more wafers are described. A plurality of process stations are arranged in a circular configuration around a rotational axis. A support assembly with a rotatable center base defining a rotational axis, at least two support arms extending from the center base and heaters on each of the support arms is positioned adjacent the processing stations so that the heaters can be moved amongst the various process stations to perform one or more process condition.
Claims17
A support assembly comprising:
- a rotatable center base defining a rotational axis;
- at least two support arms extending from the rotatable center base, each of the support arms having an inner end in contact with the center base and an outer end further from the rotational axis than the inner end;
- a plurality of heaters, each heater positioned on the outer end of each of the support arms, each of the plurality of heaters having a support surface with a center located a distance from the rotational axis so that upon rotation of the center base the heaters move in a circular path;
- and
- a channel formed in the rotatable center base and the support arms, the channel configured to route electrical connections to the plurality of heaters;
- wherein the support surfaces of the heaters are substantially coplanar.
3 more elements
A support assembly comprising:
- a rotatable center base defining a rotational axis;
- at least two support arms extending from the center base orthogonal to the rotational axis, each of the support arms having an inner end in contact with the center base and an outer end;
- a heater positioned on the outer end of each of the support arms, each of the heaters having a support surface configured to support a substrate during processing and each of the support surfaces are substantially coplanar, the heaters comprising an electrostatic chuck, each heater having a ring shaped sealing platform positioned around the heater, the sealing platforms having a top surface forming a plane that is substantially parallel with a plane formed by the support surface of the heaters;
- a channel formed in the rotatable center base and the support arms, the channel configured to route electrical connections to the plurality of heaters;
- a first motor connected to the rotatable center base to rotate the rotatable center base, support arms and heaters around the rotational axis;
- and
- a second motor connected to the rotatable center base to move the rotatable center base, support arms and heaters in a direction along the rotational axis.
4 more elements
A processing chamber comprising:
- a housing having walls, a bottom and a top defining an interior volume;
- a plurality of process stations in the interior volume of the housing, the process stations positioned in a circular arrangement around a rotational axis, each process station comprising a gas injector having a front face, the front face of each of the gas injectors being substantially coplanar;
- and
- a support assembly in the interior volume of the housing, the support assembly positioned below the plurality of process stations, the support assembly including a rotatable center base with a plurality of support arms extending from the center base, each support arm having an inner end in contact with the center base and an outer end, a heater is positioned on the outer end of each of the support arms so that upon rotation of the center base the heaters move in a circular path, the heaters having a support surface configured to support a substrate during processing, and a channel is formed in the rotatable center base and the support arms, the channel configured to route electrical connections to the heater;
- wherein the support surfaces of the heaters are substantially coplanar.
2 more elements
Dependencies are inferred from the claim text.