Support

A substrate support comprising:

• an electrostatic chuck comprising an upper surface, wherein the upper surface of the electrostatic chuck comprises a clamping region for providing an electrostatic clamping force;
• a cover that is a single piece and is positioned on the electrostatic chuck to cover the upper surface thereof, the cover comprising a first face adjacent the upper surface of the electrostatic chuck, a second face for supporting a substrate, and one or more conduits extending through the cover to permit a cooling gas to flow from the first face to the second face, wherein the second face comprises a substrate support region and a peripheral region radially outward of the substrate support region, wherein the substrate support region has a diameter smaller than that of the clamping region, and wherein the second face in the substrate support region and the second face in the peripheral region are coplanar;
• and
• a lifting assembly which in use is operable to separate a substrate from the cover;
• wherein the cover and an upper face of the electrostatic chuck are made from a same dielectric material, wherein the cover is replaceable by virtue of not being attached to the electrostatic chuck other than through electrostatic clamping of the substrate caused by the operation of the electrostatic chuck, and wherein the cover and the electrostatic chuck each have a diameter, and the diameter of the cover is larger than the diameter of the electrostatic chuck.