Methods for forming charge layers using gas and liquid phase coatings
AssigneeApplied Materials, Inc.
InventorTaichou Papo Chen
Life of this patent
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Abstract
Methods for adjusting a work function of a structure in a substrate leverage near surface doping. In some embodiments, a method for adjusting a work function of a structure in a substrate may include coating surfaces of the structure to form a doping layer in a non-solid phase that contains dopants on the surfaces of the structure and performing a dopant diffusion process using an oxidation process to drive the dopants through the surfaces the structure to embed the dopants in the structure to adjust the work function of the structure near the surfaces to form an abrupt junction profile and form an oxidation layer on the surfaces of the structure. The coating of the surfaces of the structure may be performed using a gas-phase or liquid-phase process.
Claims20
A method of adjusting a work function of a structure on a substrate, comprising:
- coating surfaces of the structure to form a doping layer in a non-solid phase that contains dopants on the surfaces of the structure, wherein the structure has an aspect ratio of at least 50:1;
- and
- performing a dopant diffusion process using an oxidation process to drive the dopants through the surfaces the structure to embed the dopants in the structure to adjust the work function of the structure near the surfaces to form an abrupt junction profile and form an oxidation layer on the surfaces of the structure.
A method of adjusting a work function of a structure on a substrate, comprising:
- coating surfaces of the structure with a plasma-based process to form a gas-phase doping layer that contains dopants on the surfaces of the structure;
- and
- performing a dopant diffusion process using a dry oxidation process to drive the dopants through the surfaces of the structure to embed the dopants in the structure to adjust the work function of the structure near the surfaces and form an oxidation layer on the surfaces of the structure, wherein the dopant diffusion process is performed at less than approximately 450 degrees Celsius and forms a charge layer with an abrupt junction profile.
A non-transitory, computer readable medium having instructions stored thereon that, when executed, cause a method for adjusting a work function of a structure in a substrate to be performed, the method comprising:
- coating surfaces of the structure to form a doping layer in a non-solid phase that contains dopants on the surfaces of the structure;
- and
- performing a dopant diffusion process using an oxidation process to drive the dopants through the surfaces the structure to embed the dopants in the structure to adjust the work function of the structure near the surfaces to form an abrupt junction profile and form an oxidation layer on the surfaces of the structure.
Dependencies are inferred from the claim text.