Method and apparatus for controlling a processing reactor

A system for processing a substrate, comprising:

• a processing chamber configured to process a substrate based on a recipe;
• a plurality of sub-systems in operable communication with the processing chamber for controlling a plurality of different parameters associated with processing the substrate;
• and
• a controller in operable communication, via a common ethernet for control automation technology (ECAT) interface, with the processing chamber and each of the plurality of sub-systems and configured to control each of the plurality of sub-systems and the processing chamber using information included in the recipe and feedback provided by each of the plurality of sub-systems,
• wherein the controller is configured to compare the information included in the recipe and the feedback provided by each of the plurality of sub-systems with stored empirical information relating to the recipe and each of the plurality of sub-systems, and adjust at least one parameter of the plurality of different parameters associated with processing the substrate based on a determined comparison,
• wherein the stored empirical information comprises an RF power setpoint at a step transition, and
• wherein, during processing of the substrate, when the controller detects a change in RF power at the step transition, the controller adjusts a pressure, which has the same step transition as the RF power setpoint step transition, to compensate for the change in RF power at the step transition and prevent pressure overshoot in the processing chamber.