Ion milling device
AssigneeHitachi High-Tech Corporation
InventorsAsako Kaneko, Hisayuki Takasu
Life of this patent
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Abstract
An ion milling device capable of high-speed milling is realized even for a specimen containing a material having an imide bond. Therefore, the ion milling device includes: a vacuum chamber 6 configured to hold a specimen 3 in a vacuum atmosphere; an ion gun 1 configured to irradiate the specimen with a non-focused ion beam 2; a vaporization container 17 configured to store a mixed solution 13 of a water-soluble ionic liquid and water; and nozzles 11, 12 configured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam.
Claims14
An ion milling device comprising:
- a vacuum chamber configured to hold a specimen in a vacuum atmosphere;
- an ion gun configured to irradiate the specimen with a non-focused ion beam;
- a vaporization container configured to store a mixed solution of a water-soluble ionic liquid and water;
- a nozzle configured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam;
- and
- a liquid level sensor configured to monitor a liquid level of the mixed solution in the vaporization container;
- a densitometer configured to measure a concentration of the mixed solution in the vaporization container;
- and
- a solution control unit configured to control, based on the liquid level and the concentration of the mixed solution, an amount of the ionic liquid and an amount of the water supplied to the vaporization container.
An ion milling device comprising:
- a vacuum chamber configured to hold a specimen in a vacuum atmosphere;
- an ion gun configured to irradiate the specimen with a non-focused ion beam;
- a vaporization container configured to store a mixed solution of a water-soluble ionic liquid and water;
- a nozzle configured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam;
- a first dew point meter configured to measure humidity in the vaporization container;
- a second dew point meter configured to measure humidity in the vicinity of the surface of the specimen processed by the ion beam;
- and
- a humidity control unit configured to control an amount of the water vapor supplied from the nozzle based on a measured value of the first dew point meter and a measured value of the second dew point meter.
Dependencies are inferred from the claim text.