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US 11,892,676 B2Granted
Self-aligned formation of angled optical device structures
AssigneeApplied Materials, Inc.
InventorsRutger Meyer Timmerman Thijssen, Ludovic Godet
Life of this patent
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Abstract
Embodiments described herein provide for methods of forming angled optical device structures. The methods described herein utilize etching a mandrel material with an etch chemistry that is selective to the hardmask, i.e., the mandrel material is etched at a higher rate than the hardmask. Therefore, mandrel trenches are formed in the mandrel material. Device material of the angled optical device structures to be formed is deposited on the plurality of angled mandrels. An angled etch process is performed on portions of the device material such that the angled optical device structures are formed.
Claims20
A method, comprising:
- disposing a hardmask layer on a mandrel material, the mandrel material disposed on a substrate;
- patterning the hardmask layer into a plurality of hardmask structures, the hardmask structures defining exposed portions of the mandrel material;
- etching the exposed portions of the mandrel material at a first etch angle to form a plurality of angled mandrels having a device angle, wherein a shadow distance is defined between a leading edge of the hardmask structures and an etch location where a leading sidewall of each angled mandrel is formed;
- removing the hardmask structures;
- depositing a device material on the substrate and on a mandrel upper surface, the leading sidewall, and a trailing sidewall of each of the plurality of angled mandrels;
- and
- removing the device material disposed on the substrate and the mandrel upper surface of the plurality of angled mandrels with an angled etch process at a second etch angle to form a plurality of angled optical device structures having the device angle.
4 more elements
A method, comprising:
- disposing a hardmask layer on a mandrel material, the mandrel material disposed on a substrate;
- patterning the hardmask layer into a plurality of hardmask structures, the hardmask structures defining exposed portions of the mandrel material;
- etching the exposed portions of the mandrel material at a first etch angle to form a plurality of angled mandrels having a device angle;
- removing the hardmask structures;
- depositing a device material on the substrate and on a mandrel upper surface, a leading sidewall, and a trailing sidewall of each of the plurality of angled mandrels;
- removing the device material disposed on the substrate and the mandrel upper surface of the plurality of angled mandrels with an angled etch process at a second etch angle to form a plurality of angled optical device structures having the device angle;
- and
- removing the plurality of angled mandrels between the plurality of angled optical device structures.
5 more elements
A method, comprising:
- disposing a hardmask layer on a mandrel material, the mandrel material disposed on a substrate;
- patterning the hardmask layer into a plurality of hardmask structures, the hardmask structures defining exposed portions of the mandrel material, the plurality of hardmask structures including:
- a patterned pitch between adjacent hardmask structures, wherein the patterned pitch is from about 200 nm to about 2000 nm;
- and
- a hardmask structure critical dimension from about 50 nm to about 500 nm;
- etching the exposed portions of the mandrel material to form a plurality of angled mandrels at a device angle, wherein a shadow distance is defined between a leading edge of the hardmask structures and an etch location where a leading sidewall of each angled mandrel is formed;
- removing the hardmask structures;
- depositing a device material on the substrate and on a mandrel upper surface, the leading sidewall, and a trailing sidewall of each of the plurality of angled mandrels;
- removing the device material disposed on the substrate and the mandrel upper surface of the plurality of angled mandrels with an angled etch process at an etch angle to form a plurality of angled optical device structures at the device angle;
- and
- removing the plurality of angled mandrels between the plurality of angled optical device structures.
8 more elements
Dependencies are inferred from the claim text.