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US 11,892,424 B2Granted
Biological detection device, biological chip, microelectrode structure and manufacturing method thereof
AssigneesBeijing BOE Technology Development Co., Ltd., Boe Technology Group Co., Ltd.
InventorsKui Liang, Shuobin Liang
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Abstract
The present disclosure provides a biological detection device, a biological chip, a microelectrode structure, and a manufacturing method of the microelectrode structure. The microelectrode structure can include a first insulating layer, a protrusion, and an electrode layer. The protrusion is disposed on the first insulating layer. The electrode layer conformally covers the first insulating layer and the protrusion. The present disclosure can improve the detection accuracy.
Claims16
A microelectrode structure, comprising:
- a first insulating layer;
- a first protrusion disposed on the first insulating layer;
- an electrode layer conformally covering the first insulating layer and the first protrusion;
- a first sensitive functional layer at least covering an area of the electrode layer corresponding to an entirety of the first protrusion;
- an auxiliary layer at least covering an area of the first sensitive functional layer corresponding to the entirety of the first protrusion, and provided with a first through hole exposing part of the first sensitive functional layer, wherein a distance between the auxiliary layer and the electrode layer is less than or equal to 100 μm;
- and
- a second sensitive functional layer covering the auxiliary layer and filling the first through hole in a way that the second sensitive functional layer is in contact with the first sensitive functional layer, and the auxiliary layer is sandwiched between the first sensitive functional layer and the second sensitive functional layer,
- wherein the first protrusion has a tapered structure, and the first through hole is provided in an area of the auxiliary layer corresponding to a top of the first protrusion.
5 more elements
A manufacturing method of a microelectrode structure, comprising:
- forming a first insulating layer on a supporting plate;
- forming a first protrusion on a side of the first insulating layer away from the supporting plate;
- forming an electrode layer that conformally covers the first insulating layer and the first protrusion;
- forming a first sensitive functional layer, the first sensitive functional layer at least covering an area of the electrode layer corresponding to an entirety of the first protrusion;
- forming an auxiliary layer that at least covers an area of the first sensitive functional layer corresponding to the entirety of the first protrusion, and provided with a first through hole exposing part of the first sensitive functional layer, wherein a distance between the auxiliary layer and the electrode layer is less than or equal to 100 μm;
- forming a second sensitive functional layer, the second sensitive functional layer covering the auxiliary layer and filling the first through hole in a way that the second sensitive functional layer is in contact with the first sensitive functional layer, and the auxiliary layer is sandwiched between the first sensitive functional layer and the second sensitive functional layer;
- and
- removing the supporting plate,
- wherein the first protrusion has a tapered structure, and the first through hole is provided in an area of the auxiliary layer corresponding to a top of the first protrusion.
6 more elements
A manufacturing method of a microelectrode structure, comprising:
- providing a template, a side of the template having a recess;
- forming an electrode layer on the side of the template having the recess, the electrode layer conformally covering the recess;
- forming a first insulating layer on a side of the electrode layer facing away from the template, wherein a part of the first insulating layer corresponding to the recess forms a first protrusion;
- removing the template;
- forming a first sensitive functional layer, the first sensitive functional layer at least covering an area of the electrode layer corresponding to an entirety of the first protrusion;
- forming an auxiliary layer that at least covers an area of the first sensitive functional layer corresponding to the entirety of the first protrusion and is provided with a first through hole exposing part of the first sensitive functional layer, wherein a distance between the auxiliary layer and the electrode layer is less than or equal to 100 μm;
- forming a second sensitive functional layer, the second sensitive functional layer covering the auxiliary layer and filling the first through hole in a way that the second sensitive functional layer is in contact with the first sensitive functional layer, and the auxiliary layer is sandwiched between the first sensitive functional layer and the second sensitive functional layer,
- wherein the first protrusion has a tapered structure, and the first through hole is provided in an area of the auxiliary layer corresponding to a top of the first protrusion.
5 more elements
Dependencies are inferred from the claim text.