Method for detecting environmental parameter in semiconductor fabrication facility
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChih-Ming Tsao, Tzu-Sou Chuang
Life of this patent
Estimating the term…
Abstract
A method of monitoring a semiconductor fabrication facility and a semiconductor fabrication facility are provided. The method includes collecting an ambient air in a clean room through a plurality of gas lines with their gas inlets arranged at a plurality of sampling positions in the clean room. The method also includes measuring a parameter of the ambient air by a plurality of metrology devices which are connected to the gas lines. At least two of the sampling positions are measured simultaneously. The method further includes issuing a warning when the parameter detected by the metrology devices is outside a range of acceptable values.
Claims20
A method of monitoring a semiconductor fabrication facility, comprising:
- collecting an ambient air in a clean room through a plurality of gas lines with their gas inlets arranged at a plurality of sampling positions in the clean room;
- measuring a parameter of the ambient air by a plurality of metrology devices which are connected to the gas lines, wherein at least two of the sampling positions are measured simultaneously through at least two of the metrology devices;
- and
- issuing a warning when the parameter detected by the metrology devices is outside a range of acceptable values.
A method of monitoring a semiconductor fabrication facility, comprising:
- collecting an ambient air in a first processing area and a second processing area of a clean room through a plurality of gas lines, wherein each of the gas lines has a gas inlet, which is formed at one end thereof and exposed to the clean room;
- monitoring a parameter of the ambient air in both of the first processing area and the second processing area by a plurality of metrology devices;
- and
- issuing a warning when the parameter detected by the metrology devices in at least one of the first processing area and the second processing area is outside a range of acceptable values.
A semiconductor fabrication facility, comprising:
- a clean room;
- a sub-clean room located underneath the clean room and separated from the clean room by a raised floor;
- a plurality of gas lines extending from the clean room to the sub-clean room, wherein each of the gas lines comprises a gas inlet, and the gas inlets are positioned at different sampling positions in the clean room;
- a plurality of metrology devices, wherein each of the metrology devices is connected with one of the gas lines and configured to independently measure a parameter of an ambient air collected from the sampling positions by the one of the gas lines;
- and
- a database server configured to process measurement results produced by the metrology devices and to identify an abnormity while the parameter is outside a range of acceptable values.
Dependencies are inferred from the claim text.