Method to measure light loss of optical films and optical substrates
AssigneeApplied Materials, Inc.
InventorsJinxin Fu, Kang Luo, Fariah Hayee, Ludovic Godet
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsJinxin Fu, Kang Luo, Fariah Hayee, Ludovic Godet
Estimating the term…
A method of optical device metrology is provided. The method includes introducing a first type of light into a first optical device during a first time period, the first optical device including an optical substrate and an optical film disposed on the optical substrate, the first optical device further including a first surface, a second surface, and one or more sides connecting the first surface with the second surface; and measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations.
A method of optical device metrology comprising:
A method of optical device metrology comprising:
A method of optical device metrology comprising:
Dependencies are inferred from the claim text.