Injector configured for arrangement within a reaction chamber of a substrate processing apparatus
AssigneeASM IP Holding B.V.
InventorsLucian C. Jdira, Chris G. M. de Ridder
Life of this patent
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Abstract
The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with at least one gas entrance opening and at least one gas exit opening. The injector may have a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis. The wall of the injector may have a varying thickness.
Claims18
An injector comprising:
- a wall,
- an internal gas conduction channel extending along a first axis,
- at least one gas entrance opening, and
- at least one gas exit opening;
- wherein the injector is substantially elongated along the first axis,
- wherein the injector has a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis,
- wherein the wall of the injector has a varying thickness,
- wherein the internal gas conduction channel has a substantially oval shaped cross section whereby the internal gas conduction channel extends along the second axis substantially larger than along the third axis, wherein the substantially oval shaped cross section is partially pinched off in the middle of a second direction by the wall having an increased thickness, and
- wherein the substantially oval shaped cross section is partially pinched off in the middle of the second direction by a bulb provided to the wall and extending into the internal gas conduction channel.
Dependencies are inferred from the claim text.