Film-forming device

A film-forming device based on atomic layer deposition, the film-forming device comprising:

• a chamber having a horizontal central axis, capable of maintaining a vacuum, and movable along the horizontal central axis, the chamber including an inner chamber and an outer chamber that houses the inner chamber;
• a workpiece holder that aligns and holds workpieces to be processed in multiple stages in the inner chamber;
• and
• a heater that heats an inside of the chamber,
• wherein the outer chamber includes a first outer lid removably connected to the outer chamber and defining a first outer chamber side wall, and a second outer lid removably connected to the outer chamber and defining a second outer chamber side wall opposite to the first outer lid along the horizontal central axis,
• wherein the inner chamber includes a first inner lid removably connected to the inner chamber and defining a first inner chamber side wall, and a second inner lid removably connected to the inner chamber and defining a second inner chamber side wall opposite to the first inner lid along the horizontal central axis,
• the workpiece holder has a first end and a second end opposite the first end, the first inner lid directly cantilever-supports the first end of the workpiece holder, and the second inner lid is not directly connected to the second end of the workpiece holder during deposition, and
• the inner chamber and the outer chamber are separately moveable horizontally relative to the workpiece holder and the first inner lid when the first inner lid is directly cantilever-supporting the first end of the workpiece holder.