Manufacturing method of an organic light emitting diode display device including an etch stop layer

A manufacturing method of an organic light emitting diode display, the method comprising:

• receiving a substrate on which a planarization layer is disposed on a thin film transistor;
• forming a pixel electrode material layer including an upper material layer, an intermediate material layer including silver, and a lower material layer on the planarization layer;
• forming an etch stop material layer including a compound having low reactivity with a fluorine-based gas on the upper material layer;
• forming an etch stop layer by first patterning the etch stop material layer;
• forming a pixel electrode including an upper layer, an immediate layer, and a lower layer by patterning the pixel electrode material layer;
• forming an inorganic material layer for a partition on the etch stop layer;
• forming the partition to expose an upper surface of the etch stop layer by patterning the inorganic material layer for the partition;
• forming the etch stop layer to expose the upper surface of the pixel electrode by second patterning the etch stop layer;
• forming an organic emission layer on an exposed portion of the upper surface of the pixel electrode;
• and
• forming a common electrode on the organic emission layer and the partition.