Method for producing an optoelectronic semiconductor chip and optoelectronic semiconductor chip

A method for producing an electronic semiconductor chip, the method comprising:

• providing a growth substrate with a growth surface comprising a flat region having a plurality of three-dimensionally designed surface structures on the flat region;
• applying a nucleation layer composed of oxygen-containing AlN directly to the growth surface onto the flat region and the three-dimensionally designed surface structures, wherein an oxygen content in the nucleation layer is greater than 1019 cm−3;
• and
• growing a nitride-based semiconductor layer sequence on the nucleation layer,
• wherein the semiconductor layer sequence overlays the three-dimensionally designed surface structures, and
• wherein growing the semiconductor layer sequence begins selectively on the flat region.