Detachable biasable electrostatic chuck for high temperature applications

A substrate support for use in a substrate processing chamber, comprising:

• a lower assembly having a base plate assembly, wherein the base plate assembly includes a plurality of electrical feedthroughs disposed about a central protrusion;
• a ceramic puck disposed on the lower assembly and removably coupled to the base plate assembly, wherein the ceramic puck has an electrode disposed therein that is electrically coupled to a first pair of electrical feedthroughs of the plurality of electrical feedthroughs;
• and
• a plurality of flexible connectors, wherein each flexible connector includes a spiral portion disposed between the ceramic puck and respective ones of the plurality of electrical feedthroughs to allow for differences in thermal expansion of the ceramic puck and the base plate assembly, wherein the ceramic puck has an interface ring extending from a lower surface of the ceramic puck, wherein the interface ring includes a central through hole that is fluidly coupled to an opening in the central protrusion of the base plate assembly and configured to flow gas therethrough.