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US 11,887,837 B2Granted
Ultraviolet light generation target, method for manufacturing ultraviolet light generation target, and electron-beam-excited ultraviolet light source
AssigneeHamamatsu Photonics K.K.
InventorsNorio Ichikawa, Kohei Ikeda
Life of this patent
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Abstract
An ultraviolet light generation target includes a light emitting layer. The light emitting layer contains a YPO4 crystal to which at least scandium (Sc) is added, and receives an electron beam to generate ultraviolet light. Further, a method of manufacturing the ultraviolet light generation target includes a first step of preparing a mixture containing yttrium (Y) oxide, Sc oxide, phosphoric acid, and a liquid, a second step of evaporating the liquid, and a third step of firing the mixture.
Claims9
An ultraviolet light generation target comprising:
- a light emitting portion containing a YPO4 crystal to which at least scandium (Sc) is added, and configured to receive an electron beam to generate ultraviolet light.
Dependencies are inferred from the claim text.