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US 11,887,821 B2Granted
Edge ring, plasma processing apparatus, and manufacturing method of edge ring
AssigneeTokyo Electron Limited
InventorMasato Kon
Life of this patent
Estimating the term…
Abstract
An edge ring includes a first member made of a first material and having a contact surface with plasma generated inside the processing container, and a second member made of a second material having Young's modulus lower than that of the first material. The second member is provided on a side opposite to the contact surface of the first member such that a combined structure of the first member and the second member surrounds a periphery of a substrate placed on a stage inside a processing container of a plasma processing apparatus.
Claims14
An edge ring comprising:
- a first edge ring integrally formed by silicon carbide and configured to surround a periphery of a substrate provided in a processing container of a plasma processing apparatus, a top surface of the first edge ring being a contact surface with plasma generated inside the processing container;
- and
- a second edge ring formed by silicon and configured to surround the periphery of the substrate, a top surface of the second edge ring being bonded to a side opposite to the contact surface of the first edge ring, and a bottom surface of the second edge ring contacting with an electrostatic chuck,
- wherein the second edge ring is divided into a plurality of parts in a circumferential direction, and a groove is formed between each of the plurality of parts such that adjacent parts among the plurality of parts of the second edge ring have a predetermined distance therebetween in the circumferential direction, and
- wherein the groove is formed by side walls of the adjacent parts of the second edge ring, and a bottom wall of the first edge ring that serves as a ceiling wall when viewed in a vertical cross section.
2 more elements
A plasma processing apparatus comprising:
- a processing container;
- a stage disposed inside the processing container and configured to place a substrate thereon;
- and
- an edge ring configured to surround a periphery of the substrate placed on the stage,
- wherein the edge ring includes:
- a first edge ring integrally formed by silicon carbide, a top surface of the first edge ring being a contact surface with plasma generated inside the processing container;
- and
- a second edge ring formed by silicon, a top surface of the second edge ring being bonded to a side opposite to the contact surface of the first edge ring, and a bottom surface of the second edge ring contacting with an electrostatic chuck,
- wherein the second edge ring is divided into a plurality of parts in a circumferential direction, and a groove is formed between each of the plurality of parts such that adjacent parts of the second edge ring have a predetermined distance therebetween in the circumferential direction, and
- wherein the groove is formed by side walls of the adjacent parts of the second edge ring, and a bottom wall of the first edge ring that serves as a ceiling wall when viewed in a vertical cross section.
7 more elements
An edge ring comprising:
- a first edge ring integrally formed by silicon carbide and configured to surround a periphery of a substrate provided in a processing container of a plasma processing apparatus, a top surface of the first edge ring being a contact surface with plasma generated inside the processing container;
- a second edge ring formed by a material in which the silicon carbide and silicon are mixed in a predetermined ratio and configured to surround the periphery of the substrate, a top surface of the second edge ring being bonded to a side opposite to the contact surface of the first edge ring;
- and
- a third edge ring formed by the silicon and configured to surround the periphery of the substrate, a top surface of the third edge ring being bonded to a bottom surface of the second edge ring and a bottom surface of the third edge ring contacting with an electrostatic chuck,
- wherein the third edge ring is divided into a plurality of parts in a circumferential direction, and a groove is formed between each of the plurality of parts such that adjacent parts of the third edge ring have a predetermined distance therebetween in the circumferential direction, and
- wherein the groove is formed by side walls of the adjacent parts of the third edge ring, and a bottom wall of the first edge ring that serves as a ceiling wall when viewed in a vertical cross section.
3 more elements
Dependencies are inferred from the claim text.