Plasma processing apparatus and plasma processing method
AssigneeTokyo Electron Limited
InventorKoichi Nagami
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Abstract
The disclosed plasma processing apparatus is provided with a chamber, a substrate support, and a power source system. The substrate support has an electrode and configured to support a substrate in the chamber. The power source system is electrically connected to the electrode and configured to apply a bias voltage to the electrode to draw ions from a plasma in the chamber into the substrate on the substrate support. The power source system is configured to output a first pulse to the electrode in a first period and output a second pulse to the electrode in a second period after the first period, as the bias voltage. Each of the first pulse and the second pulse is a pulse of a voltage. A voltage level of the first pulse is different from a voltage level of the second pulse.
Claims13
A plasma processing apparatus comprising:
- a chamber;
- a substrate support having an electrode and configured to support a substrate in the chamber;
- and
- a DC power source system electrically connected to the electrode and configured to apply a bias voltage to the electrode to draw ions from a plasma in the chamber into the substrate on the substrate support,
- wherein the power source system is configured to periodically output a first pulse to the electrode at a frequency of 100 kHz or more and 1 MHz or less in a first period and periodically output a second pulse to the electrode at a frequency of 100 kHz or more and 1 MHz or less in a second period after the first period, as the bias voltage,
- each of the first pulse and the second pulse is a pulse of a negative voltage, and
- a voltage level of the first pulse is different from a voltage level of the second pulse,
- wherein
- a controller is configured to control the power source system to output a single pulse of a positive voltage to the electrode before start of the first period within a subsequent cycle of two cycles, each of which includes the first period and the second period.
A plasma processing apparatus comprising:
- a chamber;
- a substrate support having an electrode and configured to support a substrate in the chamber;
- and
- a DC power source system electrically connected to the electrode and configured to apply a bias voltage to the electrode to draw ions from a plasma in the chamber into the substrate on the substrate support,
- wherein the power source system is configured to periodically output a first pulse to the electrode at a frequency of 100 kHz or more and 1 MHz or less in a first period and periodically output a second pulse to the electrode at a frequency of 100 kHz or more and 1 MHz or less in a second period after the first period, as the bias voltage,
- each of the first pulse and the second pulse is a pulse of a negative voltage,
- a voltage level of the first pulse is different from a voltage level of the second pulse, and
- a controller is configured to control the power source system to alternately output the first pulse and a pulse of a positive voltage to the electrode in the first period and alternately output the second pulse and a pulse of a positive voltage to the electrode in the second period.
A plasma processing method comprising:
- preparing a substrate on a substrate support provided in a chamber of a plasma processing apparatus, wherein the substrate support includes an electrode;
- periodically outputting a first pulse from a DC power source system to the electrode at a frequency of 100 kHz or more and 1 MHz or less in a first period as a bias voltage to draw ions from plasma in the chamber into the substrate;
- and
- periodically outputting a second pulse as the bias voltage from the power source system to the electrode at a frequency of 100 kHz or more and 1 MHz or less in a second period,
- wherein each of the first pulse and the second pulse is a pulse of a negative voltage, and
- a voltage level of the first pulse is different from a voltage level of the second pulse, and
- wherein the plasma processing method further comprises outputting a single pulse of a positive voltage to the electrode before start of the first period within a subsequent cycle of two cycles, each of which includes the first period and the second period.
Dependencies are inferred from the claim text.