Bias supply with a single controlled switch
AssigneeAdvanced Energy Industries, Inc.
InventorsHien Minh Nguyen, Gideon Van Zyl
Life of this patent
Estimating the term…
Abstract
Bias supplies, plasma processing systems, and associated methods are disclosed. One bias supply comprises a first inductor coupled between a first node of a switch and an output node where a first node of a second inductor is coupled to one of the output node or the first node of the switch. A voltage source is coupled between a second node of the switch and a second node of the second inductor. A connection is made between the return node and one of the second node of the switch and the second node of the second inductor. The bias supply also comprises a controller configured to cause an application of the periodic voltage between the output node and the return node by repeatedly closing the switch so current through the switch completes a full cycle.
Claims3
A bias supply to apply a periodic voltage comprising:
- an output node;
- a return node;
- a switch;
- a first inductor coupled between a first node of the switch and the output node;
- a first node of a second inductor coupled to one of the output node or the first node of the switch;
- a voltage source coupled between a second node of the switch and a second node of the second inductor;
- a connection between the return node and one of the second node of the switch and the second node of the second inductor;
- and
- a controller configured to cause an application of the periodic voltage between the output node and the return node by repeatedly closing the switch for a time just long enough for current through the switch to complete a full cycle from zero to a peak value, back to zero, to a peak value in an opposite direction and back to zero.
Dependencies are inferred from the claim text.