Flows of optimization for patterning processes

A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic apparatus comprising an illumination system and projection optics, the method comprising:

• obtaining a simulation model that models projection of radiation by the projection optics toward the substrate, wherein the simulation model models an effect of an obscuration in the projection optics and/or models anamorphic demagnification imparted to radiation by the projection optics;
• evaluating a patterning device manufacture rule, based on data regarding a simulated pattern at the substrate produced by the model, to identify one or more locations at the substrate of violation of the patterning device manufacturing rule;
• converting the one or more locations at the substrate to corresponding locations at the patterning device pattern;
• and
• configuring, based on the one or more locations at the patterning device pattern and by a hardware computer, the portion of the patterning device pattern.