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US 11,886,110 B2Granted
Imprinting apparatus
AssigneeIllumina, Inc.
InventorsTimothy J. Merkel, Ruibo Wang, Daniel Wright, Danny Yuan Chan, Avishek Aiyar, Tanmay Ghonge, Neil Brahma, Arthur Pitera
Life of this patent
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Abstract
An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.
Claims15
A method, comprising:
- applying a formulation on a surface of a silicon master including a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features having a largest opening dimension being less than about 300 nm, the formulation including:
- a first silane monomer:
- and
- a second silane monomer including a hydrolyzable chloride group, the second silane monomer being present in an amount ranging from 0.001 wt % to less than about 1.4 wt % based on a total weight of silanes present in the formulation;
- and
- curing the applied formulation, thereby forming an anti-stick layer.
3 more elements
A method, comprising:
- forming an imprinting apparatus by:
- depositing a formulation on a silicon master including a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features having a largest opening dimension of less than about 300 nm, and the formulation including:
- a first silane monomer:
- and
- a second silane monomer including a hydrolyzable chloride group, the second silane monomer being present in an amount ranging from about 0.001 wt % to less than about 1.4 wt % based on a total weight of silanes present in the formulation;
- and
- curing the formulation, thereby forming an anti-stick layer on the silicon master;
- depositing a silicon-based working stamp material on the anti-stick layer of the imprinting apparatus;
- curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of features;
- and
- releasing the working stamp from the imprinting apparatus.
8 more elements
Dependencies are inferred from the claim text.