Gas introduction structure and processing apparatus
AssigneeTokyo Electron Limited
InventorsHiroki Iriuda, Reita Igarashi, Kuniyasu Sakashita
Life of this patent
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Abstract
A gas introduction structure extends in a longitudinal direction of a processing container having a substantially cylindrical shape to supply gas into the processing container. The gas introduction structure includes an introduction section that partitions an introduction chamber, an ejection section that partitions a plurality of ejection chambers each including a plurality of gas holes through which the gas is ejected into the processing container, and a branch section that partitions a branch chamber connected to the introduction chamber. The branch chamber is branched to correspond to the number of ejection chambers in a tournament manner and connected to the ejection chambers.
Claims13
A gas introduction structure comprising:
- an introduction section that partitions an introduction chamber extending in a longitudinal direction of a processing container having a substantially cylindrical shape to supply a gas into the processing container;
- an ejection section that partitions a plurality of ejection chambers each including a plurality of gas holes through which the gas is ejected into the processing container;
- and
- a branch section that partitions a plurality of branch chambers chamber connected to the introduction chamber through a first communication pipe, branched corresponding to a number of the plurality of ejection chambers in a tournament manner through a plurality of second communication pipes, and connected to the plurality of ejection chambers through a plurality of third communication pipes,
- wherein each of a plurality of lowest-level branch chambers among the plurality of branch chambers has a symmetrical structure with respect to a horizontal plane including each of the plurality of second communication pipes.
A processing apparatus comprising:
- a processing container having a substantially cylindrical shape;
- and
- a gas introduction body extending in a longitudinal direction of the processing container and configured to supply a gas into the processing container,
- wherein the gas introduction body includes:
- an introduction section that partitions an introduction chamber;
- an ejection section that partitions a plurality of ejection chamber, each including a plurality of gas holes through which the gas is ejected into the processing container;
- and
- a branch section that partitions a plurality of branch chambers connected to the introduction chamber through a first communication pipe, branched corresponding to a number of the plurality of ejection chambers in a tournament manner through a plurality of second communication pipes, and connected to the plurality of ejection chambers through a plurality of third communication pipes,
- wherein each of a plurality of lowest-level branch chambers among the plurality of branch chambers has a symmetrical structure with respect to a horizontal plane including each of the plurality of second communication pipes.
Dependencies are inferred from the claim text.