Substrate processing device and substrate processing method

A substrate processing apparatus for removing a resist from a substrate with SPM that is a liquid mixture of sulfuric acid and hydrogen peroxide water, the apparatus comprising:

• a substrate holding unit which holds a substrate;
• a nozzle having a spout and adapted to spout SPM from the spout toward the substrate held by the substrate holding unit;
• a mixing portion communicating with the spout;
• a sulfuric acid-containing liquid supply device which recovers liquid supplied to and expelled from the substrate held by the substrate holding unit, prepares a sulfuric acid-containing liquid from the recovered liquid, and supplies the prepared sulfuric acid-containing liquid to the mixing portion;
• and
• a hydrogen peroxide water supply unit which supplies hydrogen peroxide water to the mixing portion;
• wherein the sulfuric acid-containing liquid supply device comprises a first liquid storage, and a second liquid storage,
• wherein the first liquid storage comprises:
• a first tank which stores the recovered liquid;
• and
• a sulfuric acid adding unit which adds sulfuric acid not originated from the recovered liquid to the first tank,
• wherein the second liquid storage comprises:
• a second tank which stores liquid supplied from the first tank;
• a first pipe having opposite ends connected to the second tank so that the liquid stored in the second tank is circulated therethrough;
• and
• a first heater which heats the liquid circulated through the second tank and the first pipe,
• wherein the first liquid storage further comprises:
• a second pipe having opposite ends connected to the first tank so that the sulfuric acid-containing liquid stored in the first tank is circulated therethrough;
• and
• a second heater which heats the sulfuric acid-containing liquid circulated through the first tank and the second pipe.

A substrate processing apparatus for removing a resist from a substrate with SPM that is a liquid mixture of sulfuric acid and hydrogen peroxide water, the apparatus comprising:

• a substrate holding unit which holds a substrate;
• a nozzle having a spout and adapted to spout SPM from the spout toward the substrate held by the substrate holding unit;
• a mixing portion communicating with the spout;
• a sulfuric acid-containing liquid supply device which recovers liquid supplied to and expelled from the substrate held by the substrate holding unit, prepares a sulfuric acid-containing liquid from the recovered liquid, and supplies the prepared sulfuric acid-containing liquid to the mixing portion;
• and
• a hydrogen peroxide water supply unit which supplies hydrogen peroxide water to the mixing portion;
• wherein the sulfuric acid-containing liquid supply device comprises a first liquid storage, and a second liquid storage,
• wherein the first liquid storage comprises:
• a first tank which stores the recovered liquid;
• and
• a sulfuric acid adding unit which adds sulfuric acid not originated from the recovered liquid to the first tank,
• wherein the second liquid storage comprises:
• a second tank which stores liquid supplied from the first tank;
• a first pipe having opposite ends connected to the second tank so that the liquid stored in the second tank is circulated therethrough;
• and
• a first heater which heats the liquid circulated through the second tank and the first pipe,
• wherein the first liquid storage further comprises a second pipe having opposite ends connected to the first tank so that the sulfuric acid-containing liquid stored in the first tank is circulated therethrough,
• wherein the first liquid storage further comprises a filter provided in the second pipe for capturing foreign matter contained in the sulfuric acid-containing liquid flowing through the second pipe.