Common substrate and shadow ring lift apparatus

A substrate support for use in a substrate processing chamber, comprising:

• a base plate;
• a dielectric plate coupled to the base plate and having a support surface for supporting a substrate and having one or more chucking electrodes disposed therein;
• and
• a lift apparatus comprising:
• a plurality of first lift pin assemblies having a plurality of first lift pins that extend through the base plate and the dielectric plate to raise or lower a substrate when disposed thereon;
• a plurality of second lift pin assemblies having a plurality of second lift pins extending through the base plate and configured to raise or lower an annular chamber component disposed above the substrate;
• an actuator;
• and
• a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.

A process chamber for processing a substrate, comprising:

• a chamber body defining an interior volume therein;
• a substrate support disposed in the interior volume of the chamber body, wherein the substrate support comprises:
• a pedestal for supporting the substrate;
• and
• a lift apparatus comprising:
• a plurality of first lift pin assemblies having a plurality of first lift pins extending through the pedestal and configured to raise or lower a substrate;
• a plurality of second lift pin assemblies having a plurality of second lift pins extending through the pedestal radially outward of the plurality of first lift pins;
• an actuator;
• and
• a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator;
• and
• a shadow ring disposed on the plurality of second lift pins.