Photolithography system including selective light array

A system for transferring a predetermined geometric pattern to a surface of a substrate through mask-less photolithography, comprising:

• a control system for controlling a mask-less photolithographic device and comprising at least one design file comprising the predetermined geometric pattern;
• and
• the mask-less photolithographic device comprising:
• an array of light emitters oriented to provide simultaneous exposure of all of an area of the substrate, the substrate having a photoresist on an upper surface thereof,
• wherein a subset of the array of light emitters is individually controllable to emit a variable wavelength range,
• wherein the array of light emitters is configured to transfer an entirety of the predetermined geometric pattern to the surface of the substrate,
• wherein the array of light emitters is selected for activation by instructions contained in the at least one design file,
• wherein a first plurality of light emitters is activated to emit a first wavelength and a second plurality of light emitters is activated simultaneously with the first plurality of light emitters to emit a second wavelength.

A method of transferring a geometric pattern to a surface of a substrate, the method comprising:

• receiving, from a design file, the geometric pattern;
• selecting, from a mask-less photolithography device having an array of light emitters, a subset of the array of light emitters corresponding to an entirety of the geometric pattern;
• activating the subset corresponding to the geometric pattern,
• wherein the light emitters are configured to emit at a range of different wavelengths,
• wherein a first plurality of light emitters of the subset is activated to emit at a first wavelength and a second plurality of light emitters of the subset is activated simultaneously with the first plurality of light emitters to emit at a second wavelength;
• providing simultaneous exposure to exposing a predetermined area of the surface of the substrate having a photoresist layer,
• wherein the predetermined area of the surface of the substrate corresponds to the entirety of the geometric pattern for transferring the entirety of the geometric pattern simultaneously;
• wherein providing simultaneous exposure of the predetermined area of the surface of the substrate causes a chemical reaction between the first wavelength, the second wavelength, and the photoresist layer;
• deactivating the subset of the array of light emitters to stop simultaneously exposing the substrate;
• and
• removing an unexposed portion of the photoresist layer from the substrate.