Salts and photoresists comprising same

A photoresist composition, comprising:

• a resin;
• and
• one or more salts of Formula (III):
• wherein,
• X is a single bond or a connecting group that is S, O, C═O, S═O, SO2, O—C═O, carbon, or nitrogen, or oxygen that together with the depicted Te atom forms a single ring group or a multiple fused or linked ring structure;
• R7 is a C6-60 aryl group, a C6-20 fluoroaryl group, a C1-20 heteroaryl group, a non-fluorinated C1-20 alkyl group, a non-fluorinated C3-20 cycloalkyl group, a C2-20 alkenyl group, or a C2-20 fluoroalkenyl group, each of which is substituted or unsubstituted;
• each R7′ is the same or different non-hydrogen ring substituent;
• q is an integer equal to 0 to the maximum valance permitted by the ring members;
• and
• Z comprises a counter anion comprising an inorganic group selected from SbF6−, BF4−, or B(C6F5)4×, a carboxylate, or an anion of a sulfonamide,
• wherein the one or more salts comprises one or more acid-labile groups.