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US 11,873,564 B2Granted
Etch chemistry for metallic materials
AssigneeHutchinson Technology Incorporated
InventorsDouglas P. Riemer, Peter F. Ladwig
Life of this patent
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Abstract
An etch chemistry solution for treating metallic surfaces in which the etch chemistry solution includes an oxidizing agent and gluconic acid. The etch chemistry solution may also include an oxidizing agent and a short-chained polyethylene polymer glycol or a short-chained polyethylene copolymer glycol. The metallic surfaces are usually used in circuits such as flexible circuits.
Claims7
An etch chemistry solution for treating metallic surfaces, the etch chemistry solution consisting of:
- an oxidizing agent comprising one or more of a peroxide, a persulfate compound, and combinations thereof;
- one or more of a short-chained polyethylene polymer glycol and a short-chained polyethylene copolymer glycol, wherein the short-chained polyethylene polymer glycol is xylonic acid, threonic acid, or D-glucose peracetate;
- a non-oxidizing/reducing acid comprising one or more of sulfuric acid, acetic acid, formic acid, lactic acid, phosphoric acid or combinations thereof;
- a metal activator comprising one or more of copper, cobalt, zinc, nickel, iron, manganese or alloys thereof;
- and
- optionally a surfactant.
3 more elements
An etch chemistry solution for treating metallic surfaces, the etch chemistry solution comprising:
- an oxidizing agent;
- and
- a short-chained polyethylene polymer glycol, wherein the short-chained polyethylene polymer glycol is xylonic acid, threonic acid, or D-glucose peracetate.
Dependencies are inferred from the claim text.