Ion implantation to modify glass locally for optical devices
AssigneeApplied Materials, Inc.
InventorsNai-Wen Pi, Jinxin Fu, Kang Luo, Ludovic Godet
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Abstract
Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.
Claims11
A method, comprising:
- disposing an etch material on a discrete area of an optical device substrate or an optical device layer, the etch material forming a depth in the discrete area;
- disposing a diffusion material in the depth of the discrete area, wherein ions of the diffusion material diffuse into porosities of the optical device substrate or the optical device layer and bond with the optical device substrate or the optical device layer to form an optical material;
- and
- removing excess diffusion material, the optical material having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.
Dependencies are inferred from the claim text.