Photobase generator, compound, photoreactive composition, and reaction product

A photobase generator, comprising a compound including a first skeleton represented by the following formula (a), and a second skeleton that includes a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group and that is represented by the following formula (1)-12, (1)-13, or (1)-14,

• wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation:
• wherein, in formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom;
• and in formula (1)-12 to formula (1)-14, each ofR22, R23, R24, R32, R33, R41, R42, R43, and R44 independently represents a hydrogen atom or a hydrocarbon group that may have a substituent;
• each of R21 and R31 independently represents a hydrocarbon group that may have a substituent;
• * represents a bonding position that forms a single bond by combining with * in formula (a);
• two or more of R21 to R24 are optionally bonding to each other to form a ring structure;
• two or more of R31 to R33 are optionally bonding to each other to form a ring structure;
• two or more of R41 to R44 are optionally bonding to each other to form a ring structure;
• and in a case in which a structure represented by in formula (1)-13 has a ring structure formed by bonding R31 and R33 to each other, the ring structure does not exhibit aromaticity.

A compound, comprising a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group,

• wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and a pKa of a conjugate acid of the base in water is 12 or more, and the second skeleton is a structure represented by the following formula (1)-12, or (1)-13:
• wherein, in formula (a), G is a divalent aromatic group;
• and * represents the bonding position with the nitrogen atom;
• in formula (1)-12 and formula (1)-13, each of R22, R23, R24, R32, and R33 independently represents a hydrogen atom or a hydrocarbon group that may have a substituent;
• each of R21 and R31 independently represents a hydrocarbon group that may have a substituent;
• * represents a bonding position that forms a single bond by combining with * in the formula (a);
• two or more of R21 to R24 are optionally bonding to each other to form a ring structure;
• and two or more of R31 to R33 re optionally bonding to each other to form a ring structure.

A compound, comprising a first skeleton represented by the following formula (a), and a second skeleton that includes a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group and that is represented by the following formula (1)-12, or (1)-13,

• wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation:
• wherein, in formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom;
• and in formula (1)-12 and formula (1) 13, each of R22, R23, R24, R32, and R33 independently represents a hydrogen atom or a hydrocarbon group that may have a substituent;
• each of R21 and R31 independently represents a hydrocarbon group that may have a substituent;
• * represents a bonding position that forms a single bond by combining with * in the formula (a);
• two or more of R21 to R24 are optionally bonding to each other to form a ring structure;
• two or more of R31 to R33 are optionally bonding to each other to form a ring structure;
• and in a case in which a structure represented by in formula (1)-13 has a ring structure formed by bonding R31 and R33 to each other, the ring structure does not exhibit aromaticity.