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AssigneeInpria Corporation
InventorsKai Jiang, Stephen T. Meyers, Lauren B. McQuade, Jeremy T. Anderson, Brian J. Cardineau, Benjamin L Clark, Dominick Smiddy, Margaret Wilson-Moses
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Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.
A plurality of coated substrates each comprising a substrate and a dry coating comprising an organometallic patterning composition having an average thickness from about 6 nanometers (nm) to about 50 nm, wherein the plurality of coated substrates has an average three sigma variation in dry coating thickness of no more than about 1.2 nm with a one centimeter edge exclusion.
A method for patterning a radiation sensitive coating, the method comprising:
Dependencies are inferred from the claim text.