Back to results
US 11,866,554 B2Granted
Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same
AssigneeMerck Patent GmbH
InventorsKatsuchika Suzuki, Toshiya Okamura, Tetsuo Okayasu, Thorsten Vom Stein
Life of this patent
Estimating the term…
Abstract
To provide a new silicon-containing polymer making it possible to form a cured film has features that its residual stress is small and crack resistance is high. A polycarbosilazane having particular cyclic structures.
Claims15
A polycarbosilazane comprising a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (2):
- wherein,
- R1, R2, and R3 are each independently a single bond, hydrogen or C1-4 alkyl;
- R4, R5, and R6 are each independently a single bond or hydrogen;
- provided that when R1, R2, R4, and R5 are single bonds, R1, R2, R4, and R5 are bonded to N contained in other repeating units, and when R3 and R6 are single bonds, R3 and R6 are bonded to N contained in other repeating units;
- and
- n and m are each independently 1 to 3.
3 more elements
Dependencies are inferred from the claim text.