Charged particle beam writing device and charged particle beam writing method

A charged particle beam writing device for sequentially writing patterns to a plurality of deflection positions on a target object by deflecting a charged particle beam by a deflector, the charged particle beam writing device comprising:

• a shot data generator converting write data to shot data that includes shot positions to which and shot times for which the charged particle beam is shot;
• a storage storing relation information indicating a relationship between a time elapsed since a start of deflection by the deflector and an amount of position shift in a shot position to which the charged particle beam is shot;
• a shot position corrector obtaining a first amount of position shift corresponding to an n-th (where n is an integer greater than or equal to 2) deflection position in sequential pattern writing, by using a settling time and a shot time of the deflector and the relation information, obtaining a second amount of position shift corresponding to an n−1-th deflection position by using the time elapsed since the start of deflection and the relation information, obtaining an amount of position correction by adding up the first amount of position shift and the second amount of position shift, and correcting a shot position, for the n-th deflection position, defined by the shot data based on the amount of position correction;
• and
• a writer emitting the charged particle beam to the n-th deflection position by using the shot data for which the shot position has been corrected, and writing a pattern.