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US 11,852,970 B2Granted
Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin
AssigneesMitsubishi Gas Chemical Company, Inc., The School Corporation Kansai University
InventorsHiroto Kudo, Masatoshi Echigo, Takumi Toida, Takashi Sato
Life of this patent
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Abstract
A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.
Claims11
A composition for forming a film for lithography comprising:
- a tellurium-containing compound or a tellurium-containing resin, the tellurium-containing compound or the tellurium-containing resin having an aryl structure which includes a hydroxy group or a group in which a hydrogen atom of a hydroxy group is substituted with an acid crosslinking reactive group or an acid dissociation reactive group, the tellurium-containing compound being represented by the following formula (A-2) and the tellurium-containing resin being a resin comprising a constitutional unit represented by at least one of the following formulae (C1) and (C2):
- wherein X is a 2m-valent group of 0 to 60 carbon atoms containing tellurium;
- Z is an oxygen atom, a sulfur atom, a single bond, or is not present;
- each R0A is independently selected from the group consisting of a hydrocarbon group, a halogen atom, a cyano group, a nitro group, an amino group, an alkyl group of 1 to 30 carbon atoms, an alkenyl group of 2 to 30 carbon atoms, an aryl group of 6 to 40 carbon atoms, a hydroxy group or a group in which a hydrogen atom of a hydroxy group is substituted with an acid crosslinking reactive group or an acid dissociation reactive group, and a combination thereof, wherein the alkyl group, the alkenyl group, and the aryl group each optionally have an ether bond, a ketone bond, or an ester bond, wherein at least one R0A is a hydroxy or a group in which a hydrogen atom of a hydroxy group is substituted with an acid crosslinking reactive group or an acid dissociation reactive group;
- m is an integer of 1 to 4;
- each p is independently an integer of 0 to 2;
- and each n is independently an integer of 0 to (5+2×p),
- wherein each X4 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, a hydrogen atom, or a halogen atom;
- each R6 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom;
- r is an integer of 0 to 2;
- and n6 is an integer of 2 to (4+2×r);
- a solvent;
- and
- an acid generating agent, the acid generating agent being a compound other than the tellurium-containing compound or the tellurium-containing resin, the acid generating agent generates an acid directly or indirectly by irradiation of any radiation selected from visible light, ultraviolet, excimer laser, electron beam, extreme ultraviolet (EUV), X-ray, and ion beam.
11 more elements
A resin comprising a constitutional unit represented by the following formula (B1-M′):
- wherein each X2 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, a hydrogen atom, or a halogen atom, and if an X2 includes a halogen atom, at least one X2 is selected from the group consisting of fluorine, iodine, and bromine;
- each R3 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom;
- q is an integer of 0 to 2;
- and n3 is an integer of 0 to (4+2×q).
1 more element
A resin comprising a constitutional unit represented by the following formula (B2-M):
- wherein each X2 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, a hydrogen atom, or a halogen atom, and if an X2 includes a halogen atom, at least one X2 is selected from the group consisting of fluorine, iodine, and bromine;
- each R3 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom;
- q is an integer of 0 to 2;
- n3 is an integer of 0 to (4+2×q);
- and R4 is any structure represented by the following formula (5):
- wherein R5 is a substituted or unsubstituted linear alkylene group of 1 to 20 carbon atoms, branched alkylene group of 3 to 20 carbon atoms, or cyclic alkylene group of 3 to 20 carbon atoms, or a substituted or unsubstituted arylene group of 6 to 20 carbon atoms;
- each R5′ is independently any structure of the above formula (5′) wherein * indicates that this portion is connected to R5.
4 more elements
A resin comprising a constitutional unit represented by the following formula (B2-M′):
- wherein each X2 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, a hydrogen atom, or a halogen atom;
- each R3 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom;
- q is an integer of 0 to 2;
- n3 is an integer of 0 to (4+2×q);
- and R6 is any structure represented by the following formula (6):
- wherein R7 is a substituted or unsubstituted linear alkylene group of 1 to 20 carbon atoms, branched alkylene group of 3 to 20 carbon atoms, or cyclic alkylene group of 3 to 20 carbon atoms, or a substituted or unsubstituted arylene group of 6 to 20 carbon atoms;
- each R7′ is independently any structure of the above formula (6′) wherein * indicates that this portion is connected to R7.
4 more elements
A resin comprising a constitutional unit represented by the following formula (B3-M′):
- wherein each R3 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom;
- q is an integer of 0 to 2;
- and n3 is an integer of 1 to (4+2×q).
A resin comprising a constitutional unit represented by the following formula (B4-M):
- wherein each R3 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom;
- q is an integer of 0 to 2;
- n3 is an integer of 1 to (4+2×q);
- and R4 is any structure represented by the following formula (5):
- wherein R5 is a substituted or unsubstituted linear alkylene group of 1 to 20 carbon atoms, branched alkylene group of 3 to 20 carbon atoms, or cyclic alkylene group of 3 to 20 carbon atoms, or a substituted or unsubstituted arylene group of 6 to 20 carbon atoms;
- each R5′ is independently any structure of the above formula (5′) wherein * indicates that this portion is connected to R5.
3 more elements
A resin comprising a constitutional unit represented by the following formula (B4-M′):
- wherein each R3 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom;
- q is an integer of 0 to 2;
- n3 is an integer of 0 to (4+2×q);
- and R6 is any structure represented by the following formula (6):
- wherein R7 is a substituted or unsubstituted linear alkylene group of 1 to 20 carbon atoms, branched alkylene group of 3 to 20 carbon atoms, or cyclic alkylene group of 3 to 20 carbon atoms, or a substituted or unsubstituted arylene group of 6 to 20 carbon atoms;
- each R7′ is independently any structure of the above formula (6′) wherein * indicates that this portion is connected to R7.
3 more elements
A resin comprising a constitutional unit represented by the following formula (C2):
- wherein each R6 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom, wherein at least one R6 is a hydroxy group or a group in which a hydrogen atom of a hydroxy group is substituted with an acid crosslinking reactive group or an acid dissociation reactive group;
- r is an integer of 0 to 2;
- and n6 is an integer of 2 to (4+2×r).
Dependencies are inferred from the claim text.