Vapor deposition method for preparing an amorphous lithium borosilicate
AssigneeIlika Technologies Limited
InventorsGianfranco Aresta, David Michael Laughman, Brian Elliott Hayden, Samuel Guerin
Life of this patent
Estimating the term…
Loading patent…
AssigneeIlika Technologies Limited
InventorsGianfranco Aresta, David Michael Laughman, Brian Elliott Hayden, Samuel Guerin
Estimating the term…
The present invention provides a vapour deposition method for preparing an amorphous lithium borosilicate compound or doped lithium borosilicate compound, the method comprising: providing a vapour source of each component element of the compound, wherein the vapour sources comprise at least a source of lithium, a source of oxygen, a source of boron and a source of silicon, and, optionally, a source of at least one dopant element; providing a substrate at a temperature of less than about 180° C.; delivering a flow of said lithium, said oxygen, said boron and said silicon, and, optionally, said dopant element, wherein the rate of flow of said oxygen is at least about 8×10−8 m3/s; and co-depositing the component elements from the vapour sources onto the substrate wherein the component elements react on the substrate to form the amorphous compound.
A vapour deposition method for preparing an amorphous lithium borosilicate compound or doped lithium borosilicate compound, the method comprising:
A method of making a surface-modified electrode by a vapour deposition process, the electrode comprising an electrode active material, wherein a surface of said electrode is modified by an amorphous lithium borosilicate compound or doped lithium borosilicate compound, wherein the method comprises:
Dependencies are inferred from the claim text.