Fabrication method of holographic security label

A method of fabricating a holographic security label comprising steps of:

• dot-matrix laser patterning of a hologram and alignment marks in defined areas of an art design in a photosensitive layer of a specimen, wherein the alignment marks are positioned on a side away from the hologram;
• separately developing the alignment marks on the side of the specimen from the hologram;
• depositing in vacuum of auxiliary aluminum film with a thickness of 100-200 nm;
• spin coating of a single layer of Polymethylmethacrylate (PMMA);
• precisely performing alignment and angle correction between dot-matrix and electron beam patterning areas by a scanning electron microscope;
• patterning by focused electron beam;
• developing of PMMA;
• etching of the aluminum film using Ce(NH4)2(NO3)6:HNO3;
• performing photoresist exposure (λ=405 nm);
• etching of the aluminum layer and lift-off of PMMA using Ce(NH4)2(NO3)6:HNO3;
• developing of the photoresist thus fabricating aligned areas of dot-matrix and electron beam patterned holograms;
• depositing of a silver film in vacuum;
• depositing of a nickel film using electrochemical means;
• producing of a nickel shim for roll-to-roll replication;
• replicating the holograms in a multilayer metallized or transparent polymer film;
• and
• coating the film with pressure-sensitive, thermoplastic or thermosetting adhesive and dividing the film into individual labels.